Epitaxial Reactor Precursor Delivery Pump from Canada
Metering pump for hydride and metalorganic precursors in MOCVD epitaxial reactors growing compound semiconductor layers on wafers. Ensures layer uniformity. Under HTS 8413.81.00 for semiconductor liquid pumps.
Duty Rate — Canada → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Provide bubbler system diagrams showing liquid precursor vaporization role
• Document precursor flow precision to ±0.1 sccm for classification support
• Specify GaAs/SiC epi applications in end-use statements