CMP Slurry Filtration Pump from Mexico
Pump recirculating filtered CMP slurry to maintain abrasive particle distribution for uniform wafer polishing rates across production. Semiconductor-specific filtration. HTS 8413.81.00.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document filter micron ratings and particle size distribution control
• Link to specific CMP pad/conditioner systems used