Chemical Vapor Deposition Precursor Pump from Japan
Ultra-clean pump for liquid semiconductor precursors in CVD equipment used for wafer processing into devices. Handles volatile organic precursors with contamination-free delivery. HTS 8413.81.00 includes such other pumps for semiconductor manufacturing liquids.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Specify precursor chemical compatibility and cleanroom certification levels in import docs
• Link to specific CVD reactor models to establish semiconductor manufacturing context
• Avoid 'chemical pump' generic terms; use 'semiconductor precursor delivery pump'