Chemical Vapor Deposition Precursor Pump from Germany
Ultra-clean pump for liquid semiconductor precursors in CVD equipment used for wafer processing into devices. Handles volatile organic precursors with contamination-free delivery. HTS 8413.81.00 includes such other pumps for semiconductor manufacturing liquids.
Duty Rate — Germany → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Specify precursor chemical compatibility and cleanroom certification levels in import docs
• Link to specific CVD reactor models to establish semiconductor manufacturing context
• Avoid 'chemical pump' generic terms; use 'semiconductor precursor delivery pump'