Wafer Lapping Coolant Circulation Pump from Japan
Circulation pump for coolant in wafer lappers achieving flatness tolerances for semiconductor fabrication. HTS 8413.81.0040 as other pump in wafer preparation apparatus. Removes heat and debris during lapping for mirror-surface wafers.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Provide lapping process flow diagrams; ensure pumps meet vibration specs for precision tools
• Pitfall: incorrect declaration as HVAC pumps