Of linear acting engines and motors
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Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Products classified under HTS 8412.90.90.25
Pneumatic Cylinder for Wafer Slicing Saw
This pneumatic linear acting cylinder drives the precise feed mechanism in wafer slicing saws used to cut monocrystalline semiconductor boules into thin wafers. It falls under HTS 8412.90.9025 as a part of linear acting pneumatic motors essential for semiconductor manufacturing equipment. The cylinder provides controlled linear motion critical for maintaining wafer thickness tolerances.
Linear Pneumatic Actuator for Crystal Puller
Pneumatic linear actuator used in Czochralski crystal pullers to control the precise vertical movement of the seed crystal during monocrystalline silicon boule growth. Classified under HTS 8412.90.9025 as a part of linear acting pneumatic motors for semiconductor crystal growing equipment. Provides the controlled linear motion essential for uniform crystal diameter.
Wafer Grinder Pneumatic Feed Cylinder
Pneumatic linear cylinder that controls the feed rate of semiconductor wafers through grinding, lapping, and polishing stations in wafer preparation equipment. Falls under HTS 8412.90.9025 as a linear acting pneumatic motor part specifically for bringing wafers to precise dimensional tolerances. Critical for maintaining wafer flatness required for fabrication processes.
Crystal Grinder Diameter Control Cylinder
Linear pneumatic cylinder used in crystal grinders to precisely control the grinding wheel position while shaping semiconductor boules to exact wafer diameters. Classified HTS 8412.90.9025 as part of linear acting pneumatic motors for semiconductor crystal preparation equipment. Includes flats grinding function indicating conductivity type.
Float Zone Crystal Puller Pneumatic Actuator
Specialized pneumatic linear actuator for float zone crystal growth systems that produces extremely pure monocrystalline semiconductor material. HTS 8412.90.9025 classification as linear acting pneumatic motor part for wafer manufacturing crystal pullers. Controls precise positioning during zone refining process.
Wafer Lapping Machine Pneumatic Pressure Cylinder
Pneumatic linear cylinder applying controlled pressure during wafer lapping operations to achieve critical surface flatness for semiconductor fabrication. Classified under HTS 8412.90.9025 as linear acting pneumatic motor part for wafer preparation equipment. Maintains consistent pressure across wafer surface during polishing.
Semiconductor Wafer Edge Grinder Pneumatic Drive
Linear acting pneumatic cylinder powering the edge grinding station that profiles semiconductor wafers for handling and prevents chipping during processing. HTS 8412.90.9025 as part of linear pneumatic motors in wafer preparation equipment. Ensures precise edge geometry for subsequent fabrication steps.
Czochralski Seed Dip Pneumatic Cylinder
Precision pneumatic linear cylinder controlling the initial seed crystal dipping into molten silicon during Czochralski growth process. Classified HTS 8412.90.9025 as linear acting pneumatic motor part for semiconductor crystal growers. Provides sub-micron positioning accuracy for defect-free crystal nucleation.
Wafer Polishing Head Pneumatic Lift Cylinder
Pneumatic linear actuator raising/lowering polishing heads onto semiconductor wafers to achieve mirror surface finish required for device fabrication. HTS 8412.90.9025 classification for linear acting pneumatic motor parts in wafer polishers. Controls downforce preventing subsurface damage.
Boule Handling Pneumatic Transfer Cylinder
Linear pneumatic cylinder for transferring ground semiconductor boules between processing stations in crystal preparation lines. Falls under HTS 8412.90.9025 as linear acting pneumatic motor part for wafer manufacturing equipment. Handles heavy boules (up to 300kg) with cleanroom precision.
Wafer Thickness Control Pneumatic Actuator
Precision linear pneumatic actuator maintaining constant wafer thickness during simultaneous double-side grinding operations. Classified HTS 8412.90.9025 as part of linear acting pneumatic motors in semiconductor wafer grinders. Achieves ±0.5 micron thickness uniformity across 300mm wafers.
Crystal Flat Grinding Pneumatic Traverse Cylinder
Pneumatic linear cylinder providing controlled traverse motion for grinding orientation flats on semiconductor crystal boules indicating resistivity and conductivity type. HTS 8412.90.9025 as linear acting pneumatic motor part for crystal grinders. Ensures flat location precision to 0.1 degree.
SiC Wafer Processing Pneumatic Cylinder
Heavy-duty pneumatic linear cylinder designed for silicon carbide (SiC) wafer processing equipment handling higher stresses than silicon wafers. Classified under HTS 8412.90.9025 as linear acting pneumatic motor part for compound semiconductor wafer preparation. Accommodates extreme hardness of SiC material.
Gallium Arsenide Wafer Grinder Pneumatic Drive
Linear pneumatic drive system for gallium arsenide (GaAs) wafer grinders used in compound semiconductor device fabrication. HTS 8412.90.9025 classification for linear acting pneumatic motors in wafer preparation equipment handling brittle GaAs material. Specialized contamination control design.
Automated Wafer Cassette Loader Pneumatic Cylinder
Pneumatic linear cylinder in automated cassette-to-cassette wafer loading stations for semiconductor grinders and polishers. Classified HTS 8412.90.9025 as linear acting pneumatic motor part transferring naked wafers between process tools. Cleanroom-compatible with particle generation <10 @ 0.5µm.