Float Zone Crystal Grower Stationary Blade from Japan
Stationary guide blade employed in float zone crystal growers to stabilize the molten zone during the production of high-purity silicon boules for semiconductor wafers. Classified under HTS 8406.90.70.00 as a stationary blade part of vapor turbines used in semiconductor material growth per statistical note (a)(i). It maintains positional accuracy under extreme thermal gradients.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide process flow diagrams showing integration into float zone vapor turbine systems to confirm statistical note applicability
• Label with thermal tolerance specs (e.g
• >1400°C) and semiconductor end-use declaration to prevent misclassification