Molybdenum Sputtering Target Disk from Japan
Circular molybdenum target disks for magnetron sputtering in semiconductor metallization layers. Under HTS 8102.99.00.00 as fabricated articles, not unwrought or powder form. 99.999% purity critical for microelectronics.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Declare backing plate material/composition; copper-backed targets common but must specify to avoid alloy issues
• High purity requires third-party assay certificates; CBP often tests for trace elements
• Semiconductor end-use mandates supply chain documentation for forced labor compliance