Molybdenum Sputtering Target Disk from China
Circular molybdenum target disks for magnetron sputtering in semiconductor metallization layers. Under HTS 8102.99.00.00 as fabricated articles, not unwrought or powder form. 99.999% purity critical for microelectronics.
Duty Rate — China → United States
16.2%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
Import Tips
• Declare backing plate material/composition; copper-backed targets common but must specify to avoid alloy issues
• High purity requires third-party assay certificates; CBP often tests for trace elements
• Semiconductor end-use mandates supply chain documentation for forced labor compliance