Molybdenum Sputtering Target Scrap from Japan
Used molybdenum targets from semiconductor thin-film deposition processes, machined to remove used surfaces. This high-purity scrap (99.99% Mo) falls under HTS 8102.97.00.00 for recycling into new targets. Cleaned but not remelted.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Semiconductor-grade certification mandatory; trace contaminants affect classification
• Declare target dimensions to confirm scrap vs. usable plate status
• Vacuum pack to preserve purity during ocean transit