Molybdenum Sputtering Target Scrap from Japan
Used molybdenum targets from semiconductor thin-film deposition processes, machined to remove used surfaces. This high-purity scrap (99.99% Mo) falls under HTS 8102.97.00.00 for recycling into new targets. Cleaned but not remelted.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Semiconductor-grade certification mandatory; trace contaminants affect classification
• Declare target dimensions to confirm scrap vs. usable plate status
• Vacuum pack to preserve purity during ocean transit