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Fused Silica Wafer Boat Support from Japan

Fused silica holder designed to support multiple wafer boats within oxidation furnaces for semiconductor production. Provides thermal uniformity and contamination-free handling. HTS 7020.00.30.00 covers such specialized quartz furnace components.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Declare maximum wafer capacity and boat spacing to confirm furnace holder design

Ensure cleanroom packaging; particulate contamination major import issue

Provide thermal expansion coefficient data matching silicon wafers