High-Purity Fused Quartz LPCVD Reactor Tube from Mexico
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Test for OH content and purity levels; certificates below 20ppm impurities support proper fused quartz classification
• Document compatibility with standard 200mm/300mm wafer processing equipment