High-Purity Fused Quartz LPCVD Reactor Tube from Japan
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Test for OH content and purity levels; certificates below 20ppm impurities support proper fused quartz classification
• Document compatibility with standard 200mm/300mm wafer processing equipment