High-Purity Fused Quartz LPCVD Reactor Tube from Germany
Precision fused quartz tube for low-pressure chemical vapor deposition (LPCVD) furnaces in semiconductor wafer processing. Features ultra-smooth interior to prevent particle contamination during thin film deposition. HTS 7017.10.30.00 applies as specialized fused silica glassware for diffusion/oxidation-type furnaces.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Test for OH content and purity levels; certificates below 20ppm impurities support proper fused quartz classification
• Document compatibility with standard 200mm/300mm wafer processing equipment