Semiconductor Lithography Resist Activator from Japan
Specialty aqueous solution containing the precise sulfonium chloride mixture for activating photoresists in microchip fabrication. HTS 3824.99.2500 applies as it matches the subheading's chemical composition requirements for aromatic-containing preparations.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Submit detailed formulation data to CBP if requested, as exact compound matching is critical for this narrow subheading
• Comply with TSCA import certification requirements for new chemical substances