Semiconductor Lithography Resist Activator

Specialty aqueous solution containing the precise sulfonium chloride mixture for activating photoresists in microchip fabrication. HTS 3824.99.2500 applies as it matches the subheading's chemical composition requirements for aromatic-containing preparations.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China6.5%+35.0%41.5%
🇲🇽Mexico6.5%+10.0%16.5%
🇨🇦Canada6.5%+10.0%16.5%
🇩🇪Germany6.5%+10.0%16.5%
🇯🇵Japan6.5%+10.0%16.5%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

3824.99Same rate: 41.5%

If generic photoresist additives

Broader category for other aromatic chemical mixtures not matching the specific sulfonium chlorides.

8543.90Lower: 10% vs 41.5%

If imported as part of assembled lithography equipment

Parts and accessories of electrical machinery containing these chemicals classified by apparatus function.

3824Same rate: 41.5%

If for use in semiconductor diffusion chambers

Chemical mixtures specifically for semiconductor wafer processing have dedicated subheadings.

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Import Tips & Compliance

Submit detailed formulation data to CBP if requested, as exact compound matching is critical for this narrow subheading

Comply with TSCA import certification requirements for new chemical substances