Gallium Nitride Ingot for LED Substrate Manufacturing from Japan
Cultured gallium nitride (GaN) boule grown by hydride vapor phase epitaxy, exceeding 2.5 grams, in cylindrical ingot form for subsequent wafering. Falls under HTS 3824.99.1100 as non-optical cultured crystals used in optoelectronics substrates. GaN ingots enable blue LED and high-electron-mobility transistor production due to wide bandgap properties.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide growth method documentation (HVPE/Czochralski) and defect density specs to distinguish from synthetic gemstones in Chapter 71
• Declare exact composition (GaN vs
• GaN-on-sapphire) as epi-ready affects classification; avoid bulk chemical headings