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2850.00.07.00/Titanium Silicide Powder (TiSi2)/Mexico

Titanium Silicide Powder (TiSi2) from Mexico

Titanium disilicide (TiSi2) is a contact material in microelectronics for low-resistivity silicide layers in semiconductors. Falls under HTS 2850.00.07.00 as a silicide of titanium, chemically defined. Used in VLSI fabrication for source/drain contacts.

Duty Rate — Mexico → United States

14.9%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Provide SEM/EDS composition data; critical for CBP to confirm silicide vs. alloy

• Comply with Wassenaar Arrangement if high-purity for advanced semiconductors

Titanium Silicide Powder (TiSi2) from Mexico — Import Duty Rate | HTS 2850.00.07.00