Titanium Silicide Powder (TiSi2) from Germany
Titanium disilicide (TiSi2) is a contact material in microelectronics for low-resistivity silicide layers in semiconductors. Falls under HTS 2850.00.07.00 as a silicide of titanium, chemically defined. Used in VLSI fabrication for source/drain contacts.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Provide SEM/EDS composition data; critical for CBP to confirm silicide vs. alloy
• Comply with Wassenaar Arrangement if high-purity for advanced semiconductors