Titanium Silicide Powder (TiSi2) from Germany
Titanium disilicide (TiSi2) is a contact material in microelectronics for low-resistivity silicide layers in semiconductors. Falls under HTS 2850.00.07.00 as a silicide of titanium, chemically defined. Used in VLSI fabrication for source/drain contacts.
Duty Rate — Germany → United States
14.9%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide SEM/EDS composition data; critical for CBP to confirm silicide vs. alloy
• Comply with Wassenaar Arrangement if high-purity for advanced semiconductors