High-Purity Fluorine Gas for Semiconductor Etching from Mexico
Ultra-pure F2 gas in specialized monel-lined cylinders for plasma etching in microchip manufacturing. HTS 2801.30.10.00 applies as chemically defined elemental fluorine, essential for precise silicon dioxide removal in electronics.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Cleanroom-compatible packaging required; provide semiconductor end-use certification to expedite FDA/CBP review
• Monitor for nickel fluoride formation in monel containers; common issue is purity drop during transit
• Pair with NF2 or CF4 imports under complementary codes for process kits