E-Beam Crucible for PVD Evaporation
A high-temperature ceramic or metal crucible used to hold evaporant materials in electron beam physical vapor deposition (PVD) sources. It is designed specifically for use in PVD apparatus of subheading 8543.70 and withstands extreme heat during evaporation processes.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If imported as a complete PVD apparatus rather than a part
The crucible is a component; if sold with the full system, it may be classified with the apparatus.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Ensure the crucible is declared as a part of PVD apparatus under 8543.70
• Provide technical documentation showing its specific design for PVD use to avoid reclassification
• Verify if any free trade agreements apply to reduce duty
Related Products under Tariff item 8543.90.00
Magnetron Sputtering Cathode Assembly
An assembly containing permanent magnets, cooling channels, and mounting fixtures for holding sputtering targets in PVD systems. It is essential for generating the plasma discharge in physical vapor deposition apparatus under subheading 8543.70.
PVD Anode Shield for Arc Suppression
A conductive shield that prevents arcing in unbalanced magnetron PVD sources by stabilizing plasma. It is part of the electrical systems in physical vapor deposition apparatus under subheading 8543.70 and enhances reliability in industrial coating lines.
PVD Cryogenic Pump Mounting Flange
A precision-machined flange connecting cryogenic pumps to PVD vacuum chambers for ultra-high vacuum maintenance. It is specifically designed for physical vapor deposition apparatus of subheading 8543.70, ensuring contamination-free deposition.
PVD Ion Source Grid Assembly
A multi-aperture grid that accelerates ions in ion-assisted PVD deposition sources for enhanced film adhesion. It is integral to physical vapor deposition apparatus under subheading 8543.70 and improves coating density in advanced manufacturing.
PVD Load Lock Door Assembly
A gate valve and viewport assembly for transferring substrates into PVD chambers without breaking vacuum. It is designed for physical vapor deposition apparatus in subheading 8543.70, maintaining process integrity in high-throughput systems.
PVD Mass Flow Controller Mount
A specialized bracket and feedthrough for mounting gas flow controllers on PVD process manifolds. It is designed for apparatus of subheading 8543.70, ensuring precise reactive gas delivery for controlled atmosphere deposition.