CVC Z-400 Sputtering System from United States
CVC Z-400 Sputtering System is a planar magnetron physical vapor deposition apparatus for semiconductor metallization layers, featuring cryogenic pumping and substrate preheat stations. It is a proven platform for aluminum and titanium deposition. This apparatus falls under tariff item 8543.70.00 as an electrical machine with individual functions not specified elsewhere in Chapter 85.
Duty Rate — United States → Canada
0%
Import Tips
• Provide CBSA with technical documentation showing the system's individual function
• Verify if cryogenic pumps are classifiable separately
• Consider a ruling for used equipment if applicable