CVC Z-400 Sputtering System from Japan
> The CVC Z-400 Sputtering System is a planar magnetron PVD apparatus for semiconductor metallization layers, featuring cryogenic pumping and substrate preheat stations. It is a proven platform for aluminum and titanium deposition. This apparatus falls under tariff item 8543.70.00 as an "other machine" with an individual function for sputter deposition.
Duty Rate — Japan → Canada
0%
Import Tips
• > Ensure the system is described as a complete sputtering apparatus, not as a vacuum system, to support classification under 8543.70.00
• Provide information on the substrate handling capabilities to demonstrate the individual function
• Check if the system requires any special permits for cryogenic fluids