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Wafer Polisher Slurry Distribution Ring

A perforated ring that evenly distributes chemical slurry across the semiconductor wafer surface during polishing operations, critical for uniform material removal rates. This mechanical process part has no electrical features and is not specified or included elsewhere in Chapter 84, falling under tariff item 8487.90.00.

Import Duty Rates by Country of Origin

Origin CountryMFN TariffSurtaxesTotal Effective Rate
πŸ‡¨πŸ‡³ChinaFreeβ€”Free
πŸ‡²πŸ‡½MexicoFreeβ€”Free
πŸ‡ΊπŸ‡ΈUnited StatesFreeβ€”Free
πŸ‡©πŸ‡ͺGermanyFreeβ€”Free
πŸ‡―πŸ‡΅JapanFreeβ€”Free

More Specific Codes

This product may fall under a more specific subheading:

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

8424.90.00Same rate: Free

If the ring is presented as a part of a mechanical appliance for projecting liquids of heading 84.24

Parts of appliances for projecting, dispersing or spraying liquids are classified in heading 84.24.

Not sure which classification is right?

The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item β€” and can price the duty on it in the same conversation.

Import Tips & Compliance

β€’ Ensure the ring is not classified as a part of a machine of heading 84.24 (mechanical appliances for projecting liquids) β€” if it is a complete sprayer, it may be excluded

β€’ Document its role in the polishing machine

β€’ Confirm no electrical features are present

Related Products under Tariff item 8487.90.00

Automotive Crankshaft Oil Seal

A radial oil seal designed for sealing the crankshaft in internal combustion engines, preventing oil leakage between the rotating shaft and engine block. Made from nitrile rubber with a metal reinforced outer casing, this non-electrical machinery part is not specified or included elsewhere in Chapter 84, falling under tariff item 8487.90.00.

CMP Polisher Retaining Ring

A consumable retaining ring used in chemical mechanical planarization (CMP) equipment to hold the polishing pad in place on the platen edge while allowing controlled pad wear during semiconductor wafer processing. Made from engineered plastic composite, this part has no electrical connectors, insulators, coils, contacts, or other electrical features, and is not specified or included elsewhere in Chapter 84.

Crystal Boule Grinder Workholding Chuck

A precision workholding chuck used to secure semiconductor crystal boules during diameter grinding to achieve exact wafer specifications. This mechanical part ensures accurate rotation without any electrical components, making it a machinery part not specified or included elsewhere in Chapter 84.

Crystal Grinder Coolant Nozzle Assembly

An adjustable nozzle assembly that delivers coolant precisely to the semiconductor crystal grinding zone to control heat and remove debris during processing. This purely mechanical fluid delivery part has no electrical features and is not specified or included elsewhere in Chapter 84, qualifying it under tariff item 8487.90.00.

Czochralski Crystal Puller Furnace Chamber

A critical replaceable part in Czochralski crystal pullers used to grow monocrystalline silicon boules for semiconductor wafers. The furnace chamber provides the high-temperature controlled environment necessary for crystal growth and is a mechanical part without electrical features, not specified or included elsewhere in Chapter 84.

Double-Sided Wafer Lapper Ring Carrier

A thin ring carrier that holds multiple semiconductor wafers between upper and lower lapping plates for simultaneous double-sided lapping, ensuring uniform material removal across the wafer batch. This non-electrical process part is not specified or included elsewhere in Chapter 84, falling under tariff item 8487.90.00.