Laser Pattern Generator for Reticles from United States
> A high-precision laser-based system that generates intricate patterns on chrome-on-glass reticles used in photolithography. This machine is dedicated to semiconductor mask and reticle manufacturing. It falls under tariff item 8486.40.00 as a machine used solely or principally for the manufacture of masks and reticles, as per Note 11(C) to Chapter 84.
Duty Rate — United States → Canada
0%
Import Tips
• > Provide CBSA with evidence that the pattern generator is exclusively for reticle manufacturing, including patterning capabilities
• Investigate the Machinery Program for potential duty relief
• Keep technical documentation to support classification and expedite customs processing