Electron Beam Mask Writer from Mexico
> An electron beam mask writer that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. This machine is critical for creating high-precision masks. It falls under tariff item 8486.40.00 as a machine used solely or principally for the manufacture of masks and reticles, as per Note 11(C) to Chapter 84.
Duty Rate — Mexico → Canada
0%
Import Tips
• > Provide CBSA with documentation proving the writer is dedicated to photomask manufacturing, including pattern writing specifications
• Check eligibility for the Machinery Program for duty relief on manufacturing equipment
• Keep technical manuals and intended use records for customs audits