Electron Beam Mask Writer from Japan
> An electron beam mask writer that uses electron beam lithography to directly write patterns onto photomask blanks for semiconductor reticles. This machine is critical for creating high-precision masks. It falls under tariff item 8486.40.00 as a machine used solely or principally for the manufacture of masks and reticles, as per Note 11(C) to Chapter 84.
Duty Rate — Japan → Canada
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• > Provide CBSA with documentation proving the writer is dedicated to photomask manufacturing, including pattern writing specifications
• Check eligibility for the Machinery Program for duty relief on manufacturing equipment
• Keep technical manuals and intended use records for customs audits