FPD Sputtering Target Deposition System from Japan
A magnetron sputtering system that deposits conductive and insulating films like ITO on large flat panel display substrates. This equipment is principal for forming layers in FPD manufacturing, handling Gen 8+ substrates for high-volume production.
Duty Rate — Japan → Canada
0%
Import Tips
• Verify the sputtering system is designed exclusively for FPD substrates, not semiconductor wafers
• Include specifications showing substrate size and handling mechanisms
• Maintain documentation of the system's role in FPD layer deposition for CBSA