Parts
Industrial or laboratory furnaces and ovens, including incinerators, non-electric. > Parts > Parts
Duty Rate (from China)
Products classified under Tariff item 8417.90.00.00
Crystal Boule Grinder Furnace Heat Shield
A refractory heat shield designed to maintain thermal stability within non-electric industrial furnaces used during crystal boule grinding preparation for semiconductor wafer production. It is a part of the furnace structure, not a standalone machine, and is essential for the furnace's heat containment function.
8417.90.00Crystal Grinder Post-Process Cooling Zone
A controlled cooling section for non-electric industrial furnaces, designed to prevent thermal shock in semiconductor materials after crystal boule grinding. It functions as an integral part of the furnace, regulating post-process cooling to ensure material integrity.
8417.90.00Czochralski Crystal Puller Heating Chamber
A graphite or molybdenum heating chamber used in Czochralski crystal growers for pulling monocrystalline silicon boules in semiconductor manufacturing. This chamber is a critical part of the non-electric furnace, providing the high-temperature environment needed for crystal growth.
8417.90.00Diffusion Furnace Quartz Tube Liner
A high-purity fused quartz liner inserted into diffusion furnace tubes for dopant diffusion into semiconductor wafers during device fabrication. It is a replaceable part of the non-electric furnace, protecting the tube and ensuring uniform heating.
8417.90.00Float Zone Crystal Furnace Crucible Support
A ceramic or quartz support assembly for crucibles in float zone semiconductor crystal growth furnaces, operating non-electrically via RF induction heating. It is a structural part of the furnace, holding the crucible in place during the crystal growth process.
8417.90.00RTP Furnace Lamp Reflector Assembly
A high-reflectivity reflector assembly for directing thermal radiation in Rapid Thermal Processing (RTP) furnaces for semiconductor annealing. It is a part of the non-electric furnace, enhancing heat distribution and efficiency during processing.
8417.90.00Semiconductor Incinerator Combustion Chamber
A stainless steel or ceramic-lined combustion chamber for non-electric incinerators treating semiconductor manufacturing process gases and solvents. It is a key part of the incinerator, containing the combustion process and withstanding high temperatures.
8417.90.00Wafer Annealing Furnace Muffle
A high-temperature resistant muffle (inner chamber) for rapid thermal annealing furnaces used in semiconductor wafer processing to activate dopants and repair crystal damage. It is a part of the non-electric furnace, providing a controlled environment for annealing.
8417.90.00Wafer Lapping Furnace Process Chamber
A thermal process chamber for post-lapping heat treatment furnaces that stabilize semiconductor wafers before polishing. It is an integral part of the non-electric furnace, providing the controlled heating environment needed for wafer stabilization.
8417.90.00Wafer Oxidation Furnace Boat Holder
A precision quartz or silicon carbide holder for wafer boats in thermal oxidation furnaces growing silicon dioxide layers on semiconductor wafers. It is a part of the non-electric furnace, positioning the wafers correctly during the oxidation process.