Boron-Doped Silicon Wafers from Japan
Boron-doped silicon wafers, typically 300mm in diameter, used to create p-type semiconductors for integrated circuits. The intentional boron doping for electronic applications places them under this tariff item.
Duty Rate — Japan → Canada
0%
Import Tips
• Maintain doping concentration records and wafer specifications
• Confirm the wafers are for electronic use, not solar cells, to avoid misclassification
• Use the CBSA's tariff classification advice service for large shipments