Tungsten Silicide Sputtering Target from Mexico
Tungsten silicide sputtering targets are high-purity, unworked silicide of tungsten used to deposit thin films for CMOS gates in semiconductors. They are classified under 2850.00.00 as silicides before fabrication into wafers.
Duty Rate — Mexico → Canada
0%
Import Tips
• Confirm the target is unworked and not mounted on a backing plate, as that may change classification
• Provide documentation of purity and density for CBSA
• If the target is part of a sputtering machine, consider Chapter 84