Germanium Oxide Sputtering Target Material from United States
Germanium oxide sputtering target material is GeO2 powder used for thin film deposition. In powder form, it is a pure germanium oxide and falls under this tariff item, as the intended use does not change its chemical classification.
Duty Rate — United States → Canada
0%
Import Tips
• Confirm the powder is not yet fabricated into a sputtering target, which may be classified elsewhere
• Provide purity specifications to the CBSA
• Declare the end use in thin film deposition if asked