Germanium Oxide Sputtering Target Material
Germanium oxide sputtering target material is GeO2 powder used for thin film deposition. In powder form, it is a pure germanium oxide and falls under this tariff item, as the intended use does not change its chemical classification.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the material is part of machinery for semiconductor manufacturing
Machines and apparatus for semiconductor production fall under this heading.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Confirm the powder is not yet fabricated into a sputtering target, which may be classified elsewhere
• Provide purity specifications to the CBSA
• Declare the end use in thin film deposition if asked
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