Semiconductor Wafer Processing Manostat from China
Ultra-precise manostat for semiconductor etch and deposition chambers, maintaining chamber pressure at 10^-6 torr levels automatically. HTS 9032.20.00.00 classification for automatic gas pressure regulation in high-vacuum processes critical to chip fabrication. Features mass flow integration for recipe-based control.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• ITAR/EAR export control documentation required for semiconductor equipment
• Classify separately from vacuum chambers (8419) if modular controller design
• Vacuum leak test certificates essential for customs valuation disputes