Ellipsometer for Thin Film Analysis from Mexico
Precision instrument using polarized visible light optical radiations to measure thin film thickness and optical constants via ellipsometry. Under HTS 9027.50.80.60 for other optical physical analysis apparatus. Used in semiconductor fabrication.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Polarization state detection specs mandatory for classification substantiation
• Refractive index measurement range documentation differentiates from profilometers