Ellipsometer for Thin Film Analysis from Japan
Precision instrument using polarized visible light optical radiations to measure thin film thickness and optical constants via ellipsometry. Under HTS 9027.50.80.60 for other optical physical analysis apparatus. Used in semiconductor fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Polarization state detection specs mandatory for classification substantiation
• Refractive index measurement range documentation differentiates from profilometers