Ellipsometer for Thin Film Analysis from Japan
Precision instrument using polarized visible light optical radiations to measure thin film thickness and optical constants via ellipsometry. Under HTS 9027.50.80.60 for other optical physical analysis apparatus. Used in semiconductor fabrication.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Polarization state detection specs mandatory for classification substantiation
• Refractive index measurement range documentation differentiates from profilometers