Fused Silica Ultraviolet Mirror from Japan
A mirror made from fused silica substrate with dielectric coatings optimized for UV wavelengths, used in lithography systems. Classified in HTS 9001.90.60.00 as an unmounted mirror for optical applications requiring high UV transmission.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include UV reflectivity and damage threshold specifications in technical documentation
• Confirm substrate purity and coating durability meet optical element standards
• Separate from excimer laser systems to maintain individual element classification