Laboratory Electroplating Power Supply from Japan
Benchtop DC power supply with precise current control (0.1mA resolution) for research electroplating of thin films and microelectrodes. Falls under 8543.30.90 as specialized laboratory electrolysis apparatus.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include university/research institution end-user letters for duty relief programs
• Specify microampere precision capabilities in technical documentation
• Ensure RoHS compliance for semiconductor research applications