Float Zone Crystal Grower from Germany
Apparatus employing the float zone method to produce monocrystalline semiconductor boules without crucibles, ideal for high-purity silicon and gallium arsenide. Classified in HTS 8486.40.00 per note 11(C) for wafer precursor manufacturing. Critical for oxygen-free crystal production in advanced semiconductors.
Duty Rate — Germany → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include process diagrams demonstrating float zone RF heating for semiconductor materials in entry documentation
• Confirm boule diameter specs match industry standards (150-450mm) to validate semiconductor-specific classification
• Watch for misclassification as vacuum furnaces; emphasize semiconductor boule end-use