FPD Sputtering Target Deposition System from Mexico
Magnetron sputtering equipment deposits conductive and insulating films like ITO on large FPD substrates. Under HTS 8486.30.00.00 as principal apparatus for flat panel display layer formation. Handles Gen 8+ substrates for TVs and monitors.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Catalog target materials (ITO, Al, Mo) and substrate sizes proving FPD use; vacuum chamber photos helpful
• Avoid bulk import declarations—declare as complete systems
• Check anti-dumping on sputtering targets separately