FPD Sputtering Target Deposition System from China
Magnetron sputtering equipment deposits conductive and insulating films like ITO on large FPD substrates. Under HTS 8486.30.00.00 as principal apparatus for flat panel display layer formation. Handles Gen 8+ substrates for TVs and monitors.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Catalog target materials (ITO, Al, Mo) and substrate sizes proving FPD use; vacuum chamber photos helpful
• Avoid bulk import declarations—declare as complete systems
• Check anti-dumping on sputtering targets separately