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8484.20.00.00/Gallium Arsenide Wafer Polisher Seal/Mexico

Gallium Arsenide Wafer Polisher Seal from Mexico

Mechanical seal for chemical mechanical polishing (CMP) of GaAs compound semiconductor wafers. Classified HTS 8484.20.00.00 under semiconductor statistical notes for wafer preparation equipment. Uses alkaline slurries for mirror finish.

Duty Rate — Mexico → United States

13.9%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Specify GaAs compatibility and CMP slurry type

• Defect density specs (<0.1 defects/cm²)

• Hazardous chemical resistance certification

Gallium Arsenide Wafer Polisher Seal from Mexico — Import Duty Rate | HTS 8484.20.00.00