Gallium Arsenide Wafer Polisher Seal from Mexico
Mechanical seal for chemical mechanical polishing (CMP) of GaAs compound semiconductor wafers. Classified HTS 8484.20.00.00 under semiconductor statistical notes for wafer preparation equipment. Uses alkaline slurries for mirror finish.
Duty Rate — Mexico → United States
13.9%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify GaAs compatibility and CMP slurry type
• Defect density specs (<0.1 defects/cm²)
• Hazardous chemical resistance certification