Semiconductor Wafer Lapping Machine Outer Bearing Race from Japan
Outer race optimized for cylindrical roller bearings in lapping machines that achieve ultra-flat wafer surfaces for semiconductor device fabrication. Withstands abrasive slurry conditions while maintaining sub-micron precision. HTS 8482.99.2560 applies to such other cylindrical roller bearing outer rings.
Duty Rate — Japan → United States
15.8%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document corrosion resistance for slurry environments to support semiconductor processing classification
• Provide equipment OEM specifications linking race to identified wafer lapping apparatus
• Ensure no pre-installation; loose races classify separately from assembled bearings