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FAG 7208 B-MP Angular Contact Ball and Cylindrical Roller Bearing from Japan

This high-performance combined bearing supports axial and radial forces in wafer lapping/polishing equipment, critical for flatness in semiconductor wafers. Falls under HTS 8482.80.00.60 for combined ball/cylindrical roller types. Optimized for cleanroom environments in chip fabrication.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Certify grease/lubricant type for cleanroom compatibility to support classification

Use precise model numbers in entries to match statistical suffix .60