Wafer Polisher Slurry Delivery Valve from Japan
Diaphragm valve for precise slurry delivery in chemical mechanical planarization (CMP) polishers preparing wafer surfaces for fabrication. Under HTS 8481.80.9050 as other semiconductor wafer prep appliance. Prevents agglomeration in nano-scale polishing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include CMP polisher pad/conditioner compatibility statements
• Document slurry chemistry (e.g
• ceria-based) for process specificity
• Ensure no copper contamination claims for logic fab use