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8481.80.90.50/Ion Implanter Process Gas Isolation Valve/Japan

Ion Implanter Process Gas Isolation Valve from Japan

Fast-acting isolation valve for dopant gas lines in high-energy ion implanters used after wafer preparation. HTS 8481.80.9050 covers other valves in semiconductor processing equipment. Millisecond response prevents source contamination.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Specify implant species (B, P, As) compatibility in specs

• Provide cycle life data (>1M cycles) proving fab reliability

• Link to implanter model numbers in entry documentation

Ion Implanter Process Gas Isolation Valve from Japan — Import Duty Rate | HTS 8481.80.90.50