Ion Implanter Process Gas Isolation Valve from China
Fast-acting isolation valve for dopant gas lines in high-energy ion implanters used after wafer preparation. HTS 8481.80.9050 covers other valves in semiconductor processing equipment. Millisecond response prevents source contamination.
Duty Rate — China → United States
37%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Specify implant species (B, P, As) compatibility in specs
• Provide cycle life data (>1M cycles) proving fab reliability
• Link to implanter model numbers in entry documentation