Epitaxial Reactor Precursor Gas Valve from Japan
UHP precursor gas delivery valve for MOCVD epitaxial reactors growing compound semiconductor layers on prepared wafers. HTS 8481.80.9050 for other semiconductor processing appliances. Heated design prevents condensation.
Duty Rate — Japan → United States
12%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify precursor chemicals (TMG, TMA) and temperature ratings
• Provide reactor chamber pressure specs confirming process use
• Certify for pyrophoric gas service to support classification