Liquid Level Control Valve for Wafer Polishing Slurry Tanks from Mexico
Automatically maintains slurry levels in chemical mechanical polishing tanks for wafer surface preparation. HTS 8481.80.9015 for self-operating liquid level regulation in semiconductor wafer processing equipment. Ensures consistent polishing pressure and material removal rates.
Duty Rate — Mexico → United States
12%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document slurry composition compatibility (silica, ceria, etc.) for semiconductor CMP
• Specify self-operating float or diaphragm mechanism vs electronic level sensors