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Liquid Level Control Valve for Wafer Polishing Slurry Tanks from Japan

Automatically maintains slurry levels in chemical mechanical polishing tanks for wafer surface preparation. HTS 8481.80.9015 for self-operating liquid level regulation in semiconductor wafer processing equipment. Ensures consistent polishing pressure and material removal rates.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Document slurry composition compatibility (silica, ceria, etc.) for semiconductor CMP

Specify self-operating float or diaphragm mechanism vs electronic level sensors

Liquid Level Control Valve for Wafer Polishing Slurry Tanks from Japan — Import Duty Rate | HTS 8481.80.90.15